Joerg Mallmann

Title: Joerg Mallmann: Innovator in Microlithography

Introduction

Joerg Mallmann is a notable inventor based in Boppard, Germany. He has made significant contributions to the field of microlithography, particularly in the development of projection exposure apparatuses. With a total of five patents to his name, Mallmann's work has advanced the technology used in semiconductor manufacturing.

Latest Patents

Mallmann's latest patents include a microlithographic projection exposure apparatus and a measuring device for a projection lens. This innovative apparatus is designed for immersion operation, where an immersion liquid is introduced into a space between the last lens of the projection lens and the photosensitive layer to be exposed. To mitigate fluctuations in the refractive index caused by temperature gradients in the immersion liquid, the apparatus incorporates heat transfer elements. These elements are capable of heating or cooling specific volumes of the immersion liquid, ensuring a more uniform temperature distribution.

Career Highlights

Throughout his career, Joerg Mallmann has worked with prominent companies in the field, including Carl Zeiss SMT GmbH and Carl Zeiss SMT AG. His experience in these organizations has allowed him to refine his expertise in microlithography and contribute to groundbreaking advancements in the industry.

Collaborations

Mallmann has collaborated with esteemed colleagues such as Ulrich Loering and Albrecht Ehrmann. These partnerships have fostered a collaborative environment that has led to innovative solutions in the field of projection exposure technology.

Conclusion

Joerg Mallmann's contributions to microlithography and his innovative patents have significantly impacted the semiconductor industry. His work continues to influence advancements in projection exposure technology, showcasing his importance as an inventor.