Carl Zeiss Smt Gmbh

Carl-zeiss-smt Ag

Joerg Mallmann

Ulrich Loering

Toralf Gruner

Karl-Heinz Schuster

Jens Kugler

Norbert Wabra

Ulrich Wegmann

Bernhard Geuppert

Franz Sorg

Albrecht Ehrmann

Bernhard Kneer

Rainer Hoch

Wilhelm Ulrich

Aurelian Dodoc

Hans-Juergen Rostalski

Karl Heinz Schuster

Hubert Holderer

Bernhard Gellrich

Susanne Beder

Andreas Wurmbrand

Juergen Fischer

Albrecht Ranck

A microlithographic projection exposure apparatus includes a projection lens that is configured for immersion operation. For this purpose an immersion liquid is introduced into an immersion space that is located between a last lens of the projection lens on the image side and a photosensitive layer to be exposed. To reduce fluctuations of refractive index resulting from temperature gradients occurring within the immersion liquid, the projection exposure apparatus includes heat transfer elements that heat or cool partial volumes of the immersion liquid so as to achieve an at least substantially homogenous or at least substantially rotationally symmetric temperature distribution within the immersion liquid.

Microlithographic projection exposure apparatus and measuring device for a projection lens

Exposure apparatus and measuring device for a projection lens

A microlithographic projection exposure apparatus contains an illumination system for generating projection light and a projection lens with which a reticle that is capable of being arranged in an object plane of the projection lens can be imaged onto a light-sensitive layer that is capable of being arranged in an image plane of the projection lens. The projection lens is designed for immersion mode, in which a final lens element of the projection lens on the image side is immersed in an immersion liquid. A terminating element that is transparent in respect of the projection is fastened between the final lens element on the image side and the light-sensitive layer.

Microlithographic projection exposure apparatus

A microlithographic projection exposure apparatus contains an illumination system () for generating projection light () and a projection lens () with which a reticle () that is capable of being arranged in an object plane () of the projection lens can be imaged onto a light-sensitive layer () that is capable of being arranged in an image plane () of the projection lens. The projection lens is designed for immersion mode, in which a final lens element (L; L; L; L; L; L; L; L) of the projection lens on the image side is immersed in an immersion liquid (). A terminating element () that is transparent in respect of the projection light () is fastened between the final lens element on the image side and the light-sensitive layer.

Growing community of inventors

Boppard, Germany

Joerg Mallmann