The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 12, 2009
Filed:
Aug. 13, 2004
Aurelian Dodoc, Oberkochen, DE;
Karl Heinz Schuster, Koenigsbronn, DE;
Joerg Mallmann, Oberkochen, DE;
Wilhelm Ulrich, Aalen, DE;
Hans-juergen Rostalski, Aalen, DE;
Aurelian Dodoc, Oberkochen, DE;
Karl Heinz Schuster, Koenigsbronn, DE;
Joerg Mallmann, Oberkochen, DE;
Wilhelm Ulrich, Aalen, DE;
Hans-Juergen Rostalski, Aalen, DE;
Carl Zeiss SMT AG, Oberkochen, DE;
Abstract
A microlithographic projection exposure apparatus contains an illumination system () for generating projection light () and a projection lens () with which a reticle () that is capable of being arranged in an object plane () of the projection lens can be imaged onto a light-sensitive layer () that is capable of being arranged in an image plane () of the projection lens. The projection lens is designed for immersion mode, in which a final lens element (L; L; L; L; L; L; L; L) of the projection lens on the image side is immersed in an immersion liquid (). A terminating element () that is transparent in respect of the projection light () is fastened between the final lens element on the image side and the light-sensitive layer.