Company Filing History:
Years Active: 2025
Title: The Innovations of Benjahman Julius Modeste
Introduction
Benjahman Julius Modeste is a notable inventor based in Elchingen, Germany. He has made significant contributions to the field of semiconductor lithography, holding two patents that showcase his expertise and innovative thinking. His work is primarily associated with Carl Zeiss SMT GmbH, a leading company in optical systems and lithography technology.
Latest Patents
Modeste's latest patents include a method for maintaining a projection exposure apparatus and a stop for lithography apparatus. The first patent describes a method that involves at least two modules and a reference element. This method includes steps such as removing a module, attaching a service module, referencing it to the projection exposure apparatus, and implementing maintenance measures. The second patent focuses on a stop element for lithography apparatus, which features a light-transmissive aperture and an opaque, fluid-permeable stop element outside the aperture.
Career Highlights
Throughout his career, Modeste has demonstrated a commitment to advancing technology in the semiconductor industry. His patents reflect a deep understanding of the complexities involved in lithography processes. His work has contributed to improving the efficiency and effectiveness of projection exposure apparatuses.
Collaborations
Modeste has collaborated with talented coworkers such as Toralf Gruner and Daniel Golde. These collaborations have likely enriched his work and contributed to the innovative solutions he has developed.
Conclusion
Benjahman Julius Modeste is a distinguished inventor whose contributions to semiconductor lithography have made a significant impact in the field. His patents reflect his innovative spirit and dedication to advancing technology.