Carl Zeiss Smt Gmbh

Benjahman Julius Modeste

Toralf Gruner

Jens Kugler

Dirk Heinrich Ehm

Stefan Xalter

Ulrich Loering

Ralf Zweering

Daniel Golde

A method for maintaining a projection exposure apparatus comprising at least two modules and a reference element, wherein the modules are referenced to the reference element, comprises: removing a module; attaching a service module to or in the vicinity of the projection exposure apparatus; referencing the service module to the reference element of the projection exposure apparatus; and implementing a maintenance measure with the aid of the service module.

Method for maintaining a projection exposure apparatus, service module and arrangement for semiconductor lithography

A stop, such as a numerical aperture stop, obscuration stop or false-light stop, for a lithography apparatus, includes a light-transmissive aperture and a stop element, in which or at which the aperture is provided. The stop element is opaque and fluid-permeable outside the aperture.

Stop, optical system and lithography apparatus

Growing community of inventors

Elchingen, Germany

Benjahman Julius Modeste