The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 08, 2012
Filed:
Sep. 09, 2008
Johannes Catharinus Hubertus Mulkens, Waalre, NL;
Johannes Jacobus Matheus Baselmans, Oirschot, NL;
Paul Graupner, Aalen, DE;
Erik Roelof Loopstra, Heeze, NL;
Bob Streefkerk, Tilburg, NL;
Johannes Catharinus Hubertus Mulkens, Waalre, NL;
Johannes Jacobus Matheus Baselmans, Oirschot, NL;
Paul Graupner, Aalen, DE;
Erik Roelof Loopstra, Heeze, NL;
Bob Streefkerk, Tilburg, NL;
ASML Netherlands B.V., Veldhoven, NL;
Carl Zeiss SMT AG, Oberkochen, DE;
Abstract
An immersion lithography apparatus includes a liquid supply system configured to supply a liquid to a space through which a beam of radiation passes, the liquid having an optical property that can be tuned by a tuner. The space may be located between the projection system and the substrate. The tuner is arranged to adjust one or more properties of the liquid such as the shape, composition, refractive index and/or absorptivity as a function of space and/or time in order to change the imaging performance of the lithography apparatus.