The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 10, 2012
Filed:
Sep. 25, 2008
Tjarko Adriaan Rudolf Van Empel, Eindhoven, NL;
Erik Roelof Loopstra, Heeze, NL;
Antonius Johannes Van Der Net, Tilburg, NL;
Yuri Johannes Gabriel Van DE Vijver, Best, NL;
Bernhard Gellrich, Aalen, DE;
Bauke Jansen, Deurne, NL;
Rens Sanderse, Eindhoven, NL;
Tjarko Adriaan Rudolf Van Empel, Eindhoven, NL;
Erik Roelof Loopstra, Heeze, NL;
Antonius Johannes Van Der Net, Tilburg, NL;
Yuri Johannes Gabriel Van De Vijver, Best, NL;
Bernhard Gellrich, Aalen, DE;
Bauke Jansen, Deurne, NL;
Rens Sanderse, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Carl Zeiss SMT AG, Oberkochen, DE;
Abstract
A lithographic apparatus includes a projection system configured to project a patterned beam of radiation onto a target portion of a substrate. The projection system includes a first gas-conditioned sub-environment and a second gas-conditioned sub-environment. The apparatus includes a gas control unit configured to control the feeding of conditioned gas into the first sub-environment and into the second sub-environment via the first sub-environment so as to prevent contamination from the second sub-environment to the first sub-environment. The apparatus includes a gate configured to leak the conditioned gas at a rate from the second sub-environment to ambient atmosphere, and a detector configured to detect at least one property of the second gas-conditioned environment.