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For the Inventor, By the Inventor

Eindhoven, Netherlands

Tjarko Adriaan Rudolf Van Empel

USPTO Granted Patents = 36

 

Average Co-Inventor Count = 3.0

ph-index = 6

Forward Citations = 154(Granted Patents)


Location History:

  • Endhoven, NL (2009)
  • Eindhoven, NL (2004 - 2017)

Company Filing History:

goldMedal36 out of 4,883 
 
Asml Netherlands B.v.
 patents
silverMedal2 out of 461 
 
Carl-zeiss-smt Ag
 patents
where one patent can have more than one assignee

Years Active: 2004-2017

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36 patents (USPTO):
1. 9766558 - Lithographic apparatus with flexible transportation line having varying stiffness between two objects (2017-09-19),
2. 9455172 - Electrostatic clamp (2016-09-27),
3. 9363879 - Module and method for producing extreme ultraviolet radiation (2016-06-07),
4. 9176398 - Method and system for thermally conditioning an optical element (2015-11-03),
5. 8901521 - Module and method for producing extreme ultraviolet radiation (2014-12-02),
6. 8749756 - Lithographic apparatus and device manufacturing method (2014-06-10),
7. 8711325 - Method and system for determining a suppression factor of a suppression system and a lithographic apparatus (2014-04-29),
8. 8451429 - Dichroic mirror, method for manufacturing a dichroic mirror, lithographic apparatus, semiconductor device and method of manufacturing therefor (2013-05-28),
9. 8441610 - Assembly comprising a conditioning system and at least one object, a conditioning system, a lithographic apparatus and methods (2013-05-14),
10. 8242471 - Radiation source and lithographic apparatus including a contamination trap (2012-08-14),
11. 8228487 - Lithographic apparatus and device manufacturing method (2012-07-24),
12. 8218128 - Lithographic apparatus and device manufacturing method incorporating a pressure shield (2012-07-10),
13. 8115900 - Lithographic apparatus and device manufacturing method (2012-02-14),
14. 8094287 - Lithographic appararus and method (2012-01-10),
15. 8072575 - Lithographic apparatus with temperature sensor and device manufacturing method (2011-12-06),

Title: Tjarko Adriaan Rudolf Van Empel: Pioneering Innovations in Eindhoven

Introduction:

Tjarko Adriaan Rudolf Van Empel, a forward-thinking inventor hailing from Eindhoven, NL, has left an indelible mark in the realm of inventions. With an impressive portfolio of 36 patents, his groundbreaking work continues to captivate and inspire future generations of inventors worldwide.

Latest Patents:

Among his latest patents is the "Lithographic apparatus with flexible transportation line having varying stiffness between two objects," showcasing his proficiency in revolutionizing positioning systems. Additionally, his invention of the "Electrostatic clamp" demonstrates his ingenuity in developing cutting-edge technologies for lithographic apparatuses.

Career Highlights:

Van Empel's innovative spirit shone brightly during his tenure at renowned companies such as ASML Netherlands B.V. and Carl Zeiss SMT AG, where he made significant contributions to the field of lithography. His wealth of experience and expertise have propelled him to the forefront of technological advancements in the industry.

Collaborations:

Throughout his career, Van Empel has collaborated closely with esteemed colleagues, including Koen Jacobus Johannes Maria Zaal and Joost Jeroen Ottens. Their synergistic efforts have led to the creation of groundbreaking inventions that have redefined the boundaries of innovation.

Conclusion:

In conclusion, Tjarko Adriaan Rudolf Van Empel's relentless pursuit of innovation and his ability to think outside the box have solidified his legacy as a true trailblazer in the world of inventions. His unwavering dedication to creating a better world through technology serves as a beacon of inspiration for inventors striving to make a lasting impact on society.

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