The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 10, 2014
Filed:
Jan. 30, 2012
Yuri Johannes Gabrial Van DE Vijver, Best, NL;
Jan Bernard Plechelmus Van Schoot, Eindhoven, NL;
Gerardus Hubertus Petrus Maria Swinkels, Eindhoven, NL;
Hendrikus Gijsbertus Schimmel, Utrecht, NL;
Dzmitry Labetski, Eindhoven, NL;
Tjarko Adriaan Rudolf Van Empel, Eindhoven, NL;
Yuri Johannes Gabrial Van De Vijver, Best, NL;
Jan Bernard Plechelmus Van Schoot, Eindhoven, NL;
Gerardus Hubertus Petrus Maria Swinkels, Eindhoven, NL;
Hendrikus Gijsbertus Schimmel, Utrecht, NL;
Dzmitry Labetski, Eindhoven, NL;
Tjarko Adriaan Rudolf Van Empel, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic apparatus is arranged to project a pattern from a patterning device onto a substrate is disclosed. The lithographic apparatus includes an illumination system and an outlet connected to a pumping system to pump away gas from between an inner wall and outer wall of the illumination system or, if a radiation source is present, between the inner wall of the illumination system and an inner wall of the radiation source.