The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 29, 2014

Filed:

Nov. 06, 2008
Applicants:

Hendrikus Gijsbertus Schimmel, Utrecht, NL;

Tjarko Adriaan Rudolf Van Empel, Eindhoven, NL;

Hans Johannes Maria Freriks, Veldhoven, NL;

Yuri Johannes Gabriël Van DE Vijver, Best, NL;

Gerardus Hubertus Petrus Maria Swinkels, Eindhoven, NL;

Marc Antonius Maria Haast, Eindhoven, NL;

Wendelin Johanna Maria Versteeg, Eindhoven, NL;

Peter Gerardus Jonkers, Eindhoven, NL;

Dzmitry Labetski, Eindhoven, NL;

Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03B 27/52 (2006.01);
U.S. Cl.
CPC ...
Abstract

The invention relates to a method for determining a suppression factor of a suppression system. The suppression system is arranged to suppress migration of a contaminant gas out of a first system. The suppression factor is an indication of the performance of the suppression system. The method includes introducing a tracer gas in the sub-system, providing a detection system configured to detect the amount of tracer gas that has migrated out of the first system, determining a first suppression factor for the suppression system for the tracer gas. The method further includes determining a second suppression factor for the suppression system for the contaminant gas based on the first suppression factor.


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