Asml Netherlands B.v.

Asml Holding N.v.

Amsl Netherlands B.v.

Dominicus Jacobus Petrus Adrianus Franken

Marc Wilhelmus Maria Van Der Wijst

Erik Roelof Loopstra

Antonius Johannes Josephus Van Dijsseldonk

Arno Jan Bleeker

Wilhelmus Josephus Box

Kars Zeger Troost

Peter Conrad Kochersperger

Bernardus Antonius Johannes Luttikhuis

Lambertus Gerardus Maria Kessels

Robertus Johannes Marinus De Jongh

Petrus Rutgerus Bartray

Marius Ravensbergen

Josephus Jacobus Smits

Martinus Hendricus Hendricus Hoeks

Engelbertus Antonius Franciscus Van Der Pasch

Marc Johannes Martinus Engels

Bastiaan Stephanus Hendrikus Jansen

Martinus Hendrikus Antonius Leenders

Nicolaas Rudolf Kemper

Johannes Hubertus Josephina Moors

Engelbertus Antonius Fransiscus Van Der Pasch

Henrikus Herman Marie Cox

Stephen Roux

Maurice Willem Jozef Etiënne Wijckmans

Albrecht Hof

Michael L Nelson

Frank Auer

Gerard Van Schothorst

Henricus Gerardus Tegenbosch

Johannes Hendrikus Gertrudis Franssen

Hendrikus Herman Marie Cox

Lambertus Adrianus Van Den Wildenberg

Bastiaan Stephanus Hendricus Jansen

Michael Jozefa Mathijs Renkens

Pertrus Rutgerus Bartray

Johannes Theodorus Guillielmus Maria Van De Ven

Klaus Mehlkopp

Jacob Kleijn

Michiel Puyt

Johan Juliana Dries

Michael M&uuml;hlbeyer

Teun Peterus Adrianus De Wilt

Tobrjörn Sandström

Bastiaan S H Jansen

Marc Van Der Wijst

Martijn Johannes Verbunt

G&uuml;nter Maul

Erik Roeloff Loopstra

Arno Jano Bleeker

Rogier Herman Mathijs Groeneveld

Mark Wilhelmus Maria Van Der Wijst

Josephus Jakobus Smits

Wilhelmua Josephus Box

A lithographic apparatus is disclosed that includes a support constructed to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam and a substrate table constructed to hold a substrate. Further, the lithographic apparatus includes a projection system configured to project the patterned radiation beam onto a target portion of the substrate, the projection system being mounted to a reference element of the lithographic apparatus by a resilient mount to reduce a transfer of high frequency vibration from the reference element to the projection system and a control system to counteract a position error of the substrate table and the support relative to the projection system.

Lithographic apparatus and device manufacturing method

A maskless lithography system has a patterning array assembly formed by a plurality of patterning arrays, each patterning array having a substrate. Each patterning array has a plurality of individually controllable elements to endow an incoming radiation beam with a patterned cross-section. To reduce the global unflatness of the patterning array assembly that is oriented in a first plane, the position of at least one substrate of a patterning array is adjusted to a second orientation. Reduction of the global unflatness of the patterning array assembly reduces a telecentricity error without introducing additional error into the maskless lithography system.

A lithographic apparatus is disclosed having a deformable lens element through which a patterned radiation beam is arranged to pass before reaching a substrate and having a deformable lens actuator configured to transmit a combination of a force substantially parallel to the optical axis of the projection system and a localized torque about an axis substantially perpendicular to the optical axis independently at a plurality of sub-regions on the deformable lens element.

Methods of manufacturing an integrated circuit by a lithographic apparatus are disclosed. The methods include patterning a radiation beam with a patterning device, projecting the patterned beam onto a substrate using a projection system, and determining the position of the patterning device. In one example, the patterning device's position relative to the projection system is determined by measuring the position of the patterning device's support structure. In another example, the position can be determined by measuring a position of the patterning device relative to its support and by measuring a position of the support. In another example, a Z-position of the patterning device is determined by directing at least one beam of radiation onto a part of the patterning device located outside a pattern area. This can be done by directing a pair of laser beams from sensors on the projection system to reflecting strips on the patterning device.

Integrated circuit manufacturing methods with patterning device position determination

An assembly includes a first element having a predetermined functionality that is to be positioned with respect to a second element. The elements are arranged in a spaced relationship on a support frame. The support frame is provided with an interface surface formed on or in the support frame for receiving the first element. The interface surface determines the position of the first element with respect to the second element, and is configured in accordance with the predetermined functionality so that the first element is positionable with respect to the second element with at least three degrees of freedom.

Assembly

A lithographic apparatus includes an illumination system constructed and arranged to condition a radiation beam, and a support constructed and arranged to support a patterning device. The patterning device is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The apparatus also includes a substrate table constructed and arranged to hold a substrate, and a projection system constructed and arranged to project the patterned radiation beam onto a target portion of the substrate. The substrate table includes a plurality of projections constructed and arranged to support corresponding parts of a bottom section of the substrate, and an actuator constructed and arranged to excite a shockwave in the substrate.

Lithographic apparatus and a subtrate table for exciting a shockwave in a substrate

A lithographic apparatus includes a projection optics assembly for projecting a patterned beam onto a target portion of a substrate. The projection optics assembly includes a first element having a predetermined functionality that is positioned with respect to a second element in a spaced relationship on a support frame. The support frame has an interface surface formed on or in the support frame for receiving the first element. The interface surface determines the position of the first element with respect to the second element, and is configured in accordance with the predetermined functionality so that the first element is positionable with respect to the second element with at least three degrees of freedom.

Assembly, a lithographic apparatus, and a device manufacturing method

A lithographic apparatus, a device manufacturing method, and a projection element for use in a lithographic apparatus are disclosed. The lithographic apparatus has a radiation system for providing a pulsed beam of radiation, a patterning device for imparting the beam with a pattern to form a patterned radiation beam, and a projection system having a projection element for projecting the patterned beam onto a target portion of a substrate. The apparatus further comprises an actuator for moving the projection element for shifting the patterned beam that is projected onto the substrate during at least one pulse of the radiation system. This can be done to compensate for a positional error between a substrate table holding the substrate and an aerial image of the projection system. The positional error could occur due to mechanical vibrations in the frame system of the lithographic apparatus.

Lithographic apparatus, device manufacturing method, and a projection element for use in the lithographic apparatus

A lithographic apparatus is disclosed. The apparatus includes a radiation system for supplying a beam of radiation, and a support structure for supporting a patterning device. The patterning device serves to pattern the beam of radiation according to a desired pattern. The apparatus also includes a projection system for projecting the patterned beam of radiation onto a target portion of a substrate, and an assembly for determining a spatial position of the patterning device relative to the projection system. The assembly includes a measuring unit that has a plurality of sensors that are mounted on the projection system.

Lithographic apparatus with patterning device position determination

A lithographic apparatus provided with an array of individually controllable elements that is detachably mounted to mounting points on a support frame of the lithographic apparatus.

One or more patterning arrays are mounted to a mounting plate via height adjustment structures that enable the flatness of the active surfaces of the patterning arrays to be controlled. The height adjustment structures may comprise an array of piezoelectric actuators or screws. Alternatively, the backside of the patterning means may be polished to optical flatness and bonded by crystal bonding to an optically flat surface of a rigid mounting body.

A lithographic apparatus includes an illumination system for providing a beam of radiation, and a support structure for supporting a patterning device. The patterning device serves to impart the projection beam with a pattern in its cross-section. The apparatus also includes a substrate table for holding a substrate, and a projection system for projecting the patterned beam onto a target portion of the substrate. At least one of the patterning device, or the projection system, and the illumination system includes a reflector assembly that includes a reflector substrate with a reflective surface for reflecting part of incident radiation, and a heat exchanger system that is constructed and arranged to exchange heat with the reflector substrate. The heat exchanger system includes a thermally active element that is disposed in a recess of the reflector substrate at a side of the reflector substrate that is different from the reflective surface.

A system and method are used to allow for compensation of a thermal output of an array of individually controllable elements. This can be done by inputting control signals to the array when it is not being used to pattern a projection beam in order to maintain the temperature of the array. A heating element can be provided to maintain the temperature of the array. A thermal reservoir can be provided to maintain the temperature of the array or a cooling element can be provided to reduce the temperature of the array during use.

A lithographic apparatus includes a projection system including a movable optical element. The movable optical element is capable, by a displacement thereof to influence a position quantity of a radiation beam projected by the projection system. A control device is provided to drive the optical element actuator to influence a position quantity of the movable optical element, thereby influencing a position quantity of the radiation beam as projected by the projection system. The control device is adapted to move the movable optical element to position the radiation beam as projected by the projection system with respect to the substrate, or to correct a position quantity of the radiation beam as projected by the projection system caused by any type of disturbance on the projection system.

Growing community of inventors

Veldhoven, Netherlands

Dominicus Jacobus Petrus Adrianus Franken