The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 28, 2010
Filed:
Oct. 31, 2008
Petrus Rutgerus Bartray, Ysselsteyn, NL;
Wilhelmus Josephus Box, Eskel, BE;
Dominicus Jacobus Petrus Adrianus Franken, Veldhoven, NL;
Bernardus Antonius Johannes Luttikhuis, Nuenen, NL;
Engelbertus Antonius Franciscus Van Der Pasch, Oirschot, NL;
Marc Wilhelmus Maria Van Der Wijst, Veldhoven, NL;
Marc Johannes Martinus Engels, Helden, NL;
Petrus Rutgerus Bartray, Ysselsteyn, NL;
Wilhelmus Josephus Box, Eskel, BE;
Dominicus Jacobus Petrus Adrianus Franken, Veldhoven, NL;
Bernardus Antonius Johannes Luttikhuis, Nuenen, NL;
Engelbertus Antonius Franciscus Van Der Pasch, Oirschot, NL;
Marc Wilhelmus Maria Van Der Wijst, Veldhoven, NL;
Marc Johannes Martinus Engels, Helden, NL;
ASML Netherland B.V., Veldhoven, NL;
Abstract
Methods of manufacturing an integrated circuit by a lithographic apparatus are disclosed. The methods include patterning a radiation beam with a patterning device, projecting the patterned beam onto a substrate using a projection system, and determining the position of the patterning device. In one example, the patterning device's position relative to the projection system is determined by measuring the position of the patterning device's support structure. In another example, the position can be determined by measuring a position of the patterning device relative to its support and by measuring a position of the support. In another example, a Z-position of the patterning device is determined by directing at least one beam of radiation onto a part of the patterning device located outside a pattern area. This can be done by directing a pair of laser beams from sensors on the projection system to reflecting strips on the patterning device.