The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 11, 2007
Filed:
Dec. 23, 2004
Antonius Johannes Josephus Van Dijsseldonk, Hapert, NL;
Dominicus Jacobus Petrus Adrianus Franken, Veldhoven, NL;
Robertus Johannes Marinus DE Jongh, Eindhoven, NL;
Jacob Kleijn, Wintelre, NL;
Bastiaan S H Jansen, Waalre, NL;
Marc Van Der Wijst, Veldhoven, NL;
Antonius Johannes Josephus Van Dijsseldonk, Hapert, NL;
Dominicus Jacobus Petrus Adrianus Franken, Veldhoven, NL;
Robertus Johannes Marinus De Jongh, Eindhoven, NL;
Jacob Kleijn, Wintelre, NL;
Bastiaan S H Jansen, Waalre, NL;
Marc Van Der Wijst, Veldhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic apparatus includes a projection system including a movable optical element. The movable optical element is capable, by a displacement thereof to influence a position quantity of a radiation beam projected by the projection system. A control device is provided to drive the optical element actuator to influence a position quantity of the movable optical element, thereby influencing a position quantity of the radiation beam as projected by the projection system. The control device is adapted to move the movable optical element to position the radiation beam as projected by the projection system with respect to the substrate, or to correct a position quantity of the radiation beam as projected by the projection system caused by any type of disturbance on the projection system.