Company Filing History:
Years Active: 2007
Title: Innovator Spotlight: Bastiaan S H Jansen
Introduction:
Bastiaan S H Jansen, a talented inventor based in Waalre, the Netherlands, has made significant contributions to the field of lithography with his innovative patent on a lithographic apparatus and device manufacturing method.
Latest Patents:
Jansen's notable patent involves a lithographic apparatus comprising a projection system with a movable optical element. This element can influence the position of a radiation beam projected by the system. A control device drives the optical element actuator to adjust the position of the radiation beam with respect to the substrate, correcting any disturbances on the projection system.
Career Highlights:
Bastiaan S H Jansen is associated with ASML Netherlands B.V., a prominent company in the field of lithography technology. His expertise and groundbreaking ideas have helped ASML stay at the forefront of technological advancements in the industry. Jansen's dedication to innovation and problem-solving is evident in his work on the lithographic apparatus.
Collaborations:
Throughout his career, Bastiaan S H Jansen has collaborated with skilled professionals in the field of lithography. Some of his notable coworkers include Antonius Johannes Josephus Van Dijsseldonk and Dominicus Jacobus Petrus Adrianus Franken. Together, they have pushed the boundaries of technological innovation and made significant contributions to the field.
Conclusion:
In conclusion, Bastiaan S H Jansen is a visionary inventor whose work has had a profound impact on the field of lithography. His dedication to pushing the boundaries of technology and collaborating with industry experts sets him apart as a pioneering figure in the world of innovation. Jansen's patent serves as a testament to his inventive spirit and commitment to advancing the field of lithography.