The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 29, 2007
Filed:
Jul. 20, 2004
Robertus Johannes Marinus DE Jongh, Eindhoven, NL;
Petrus Marinus Christianus Maria Van Den Biggelaar, Nuenen, NL;
Thomas Augustus Mattaar, Veldhoven, NL;
Jan Van DE Ven, Eindhoven, NL;
Robertus Johannes Marinus De Jongh, Eindhoven, NL;
Petrus Marinus Christianus Maria Van Den Biggelaar, Nuenen, NL;
Thomas Augustus Mattaar, Veldhoven, NL;
Jan Van De Ven, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic apparatus is presented that includes a controller having a series connection of at least two integrators and an integrator output circuit for deriving an output quantity of the series connection of integrators. The controller also includes an integrator saturator that is operatively coupled to the integrator output circuit and having an operating area for passing through the output quantity and a saturation area for saturating the output quantity. A saturation control mechanism for controlling saturation sets an output quantity of at least one of the series-connected integrators to a neutral value, when the integrator saturator is in the saturation area, except when the output quantity of or an input quantity of at least one of the series-connected integrators has a value such that it would tend to bring the integrator saturator from the saturation area to the operating area.