The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 05, 2016
Filed:
Oct. 21, 2013
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Asml Netherlands B.v., Veldhoven, NL;
Juergen Fischer, Heidenheim, DE;
Ulrich Schoenhoff, Ulm, DE;
Bernhard Geuppert, Aalen, DE;
Hans Butler, Best, NL;
Robertus Johannes Marinus De Jongh, Eindhoven, NL;
Carl Zeiss SMT GmbH, Oberkochen, DE;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
An arrangement actuates an element in a microlithographic projection exposure apparatus. The arrangement includes first and second actuators and first and second mechanical couplings. The first and second actuators are coupled to the element via corresponding ones of the first and second mechanical couplings for applying respective forces to the element which is regulatable in at least one degree of freedom. The first and second actuators have first and second actuator masses, respectively, and the first actuator mass and the first mechanical coupling conjointly define a first mass-spring system operating as a first low-pass filter. The second actuator mass and the second mechanical coupling conjointly define a second mass-spring system operating as a second low-pass filter. The first and second mass-spring systems have first and second natural frequencies deviating from each other by a maximum deviation equal to 10% of the largest of the first and second natural frequencies.