Asml Netherlands B.v.

Carl Zeiss Smt Gmbh

Robertus Johannes Marinus De Jongh

Hans Butler

Maurice Willem Jozef Etiënne Wijckmans

Marc Wilhelmus Maria Van Der Wijst

Christiaan Alexander Hoogendam

Jan Bernard Plechelmus Van Schoot

Antonius Johannes Josephus Van Dijsseldonk

Dominicus Jacobus Petrus Adrianus Franken

Adrianus Hendrik Koevoets

Robertus Leonardus Tousain

Michael Jozef Mathijs Renkens

Martinus Agnes Willem Cuijpers

Roel Johannes Elisabeth Merry

Leon Leonardus Franciscus Merkx

Ronald Petrus Hendricus Faassen

Erik Roelof Loopstra

Bob Streefkerk

Timotheus Franciscus Sengers

Franciscus Johannes Joseph Janssen

Bernhard Geuppert

Wilhelmus Franciscus Johannes Simons

Juergen Fischer

Wilhelmus Petrus De Boeij

Jeroen Pieter Starreveld

Ulrich Schoenhoff

Christiaan Louis Valentin

Thomas Augustus Mattaar

Petrus Marinus Christianus Maria Van Den Biggelaar

Bastiaan Stephanus Hendricus Jansen

Jacob Kleijn

Michael Frederik Ypma

Bastiaan S H Jansen

Marc Van Der Wijst

Jan Van De Ven

Marinus Engelbertus Cornelis Mutsaers

Raoul Maarten Simon Knops

Rogier Herman Mathijs Groeneveld

Disclosed is a projection system for a lithographic apparatus, comprising: a plurality of optical elements configured to direct a beam along a path, and a control system configured to receive an input signal indicative of a deformation of a first optical element of the plurality of optical elements. The plurality of optical elements may be configured to position the beam onto an object arranged on an object support, and a pattern may be imparted on the beam by a patterning device arranged on support structure. The control system is configured to generate an output signal for controlling a position of at least a second optical element of the plurality of optical elements, based on said input signal; and/or an output signal for controlling a position of said object support, based on said input signal; and/or an output signal for controlling a position of said support structure, based on said input signal.

Projection system and lithographic apparatus comprising said projection system

A projection system (PS) for a lithographic apparatus comprises: an optical path (); a plurality of sensors (S-S); one or more actuators (A-A); and a controller (CN). The optical path is operable to receive an input radiation beam (Bin) and to project an output radiation beam (Bout) onto a substrate to form an image. The optical path comprises: a plurality of optical elements (M-M), the plurality of optical elements comprising: a first set of at least two optical elements (M, M) and a second set of at least one optical element (M, M). Each sensor is associated with one of the plurality of optical elements and is operable to determine a position of that optical element. Each actuator is associated with one of the second set of optical elements and is operable to adjust that optical element. The controller is operable to use the one or more actuators to adjust the second set of optical elements in dependence on the determined position of the first set of optical elements so as to at least partially compensate for optical aberrations and/or line-of-sight errors caused by the positions of the first set of optical elements.

Projection system

A lithographic apparatus includes a reflector to redirect a radiation beam, e.g. an EUV beam. The position of the reflector is controlled using a controller and a positioning system. The positioning system includes a non-compensating actuator device and a compensating actuator device to compensate for parasitic forces of the non-compensating actuator device. The positioning system and controller can provide a more accurate position of the reflector, reduce deformation of the reflector and reduce the magnitude of forces transmitting through the reflector.

Lithographic apparatus and device manufacturing method

An arrangement actuates an element in a microlithographic projection exposure apparatus. The arrangement includes first and second actuators and first and second mechanical couplings. The first and second actuators are coupled to the element via corresponding ones of the first and second mechanical couplings for applying respective forces to the element which is regulatable in at least one degree of freedom. The first and second actuators have first and second actuator masses, respectively, and the first actuator mass and the first mechanical coupling conjointly define a first mass-spring system operating as a first low-pass filter. The second actuator mass and the second mechanical coupling conjointly define a second mass-spring system operating as a second low-pass filter. The first and second mass-spring systems have first and second natural frequencies deviating from each other by a maximum deviation equal to 10% of the largest of the first and second natural frequencies.

Arrangement for actuating an element in a microlithographic projection exposure apparatus

A projection system (PS) is provided which includes, in an embodiment, two frames. The optical elements of the projection system are mounted on a first frame (). The position of the optical elements is measured relative to a second frame () using a first measurement system (). A second measurement system () is used to measure a parameter associated with a deformation of the second frame. The measurement made by the second measurement system can be used to compensate for any errors in the position of the optical elements as measured by the first measurement system resulting from deformations of the second frame. Typically, deformations of the frames are due to resonant oscillation and thermal expansion. Having two frames enables the optical elements of the projection system to be positioned with a high degree of accuracy. Optionally, a temperature control system () may be provided to drive the temperature of at least one of the frames back to a desired value after the lithographic apparatus has been taken off line.

Projection system and lithographic apparatus

A positioning system to position a table within a base frame of a lithographic apparatus, the positioning system including first and second actuators and a controller. The first actuator exerting an actuation force on the table. The first actuator being connected to a balance mass constructed and arranged to absorb a reaction force of the first actuator. The controller and second actuator constructed and arranged to exert a compensation force and/or torque to compensate a torque caused by the actuation force exerted by the first actuator on the balance mass.

Positioning system, lithographic apparatus and device manufacturing method

A lithographic apparatus is disclosed that includes a support constructed to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam and a substrate table constructed to hold a substrate. Further, the lithographic apparatus includes a projection system configured to project the patterned radiation beam onto a target portion of the substrate, the projection system being mounted to a reference element of the lithographic apparatus by a resilient mount to reduce a transfer of high frequency vibration from the reference element to the projection system and a control system to counteract a position error of the substrate table and the support relative to the projection system.

A lithographic apparatus includes a projection system including a movable optical element. The movable optical element is capable, by a displacement thereof to influence a position quantity of a radiation beam projected by the projection system. A control device is provided to drive the optical element actuator to influence a position quantity of the movable optical element, thereby influencing a position quantity of the radiation beam as projected by the projection system. The control device is adapted to move the movable optical element to position the radiation beam as projected by the projection system with respect to the substrate, or to correct a position quantity of the radiation beam as projected by the projection system caused by any type of disturbance on the projection system.

A lithographic apparatus is presented that includes a controller having a series connection of at least two integrators and an integrator output circuit for deriving an output quantity of the series connection of integrators. The controller also includes an integrator saturator that is operatively coupled to the integrator output circuit and having an operating area for passing through the output quantity and a saturation area for saturating the output quantity. A saturation control mechanism for controlling saturation sets an output quantity of at least one of the series-connected integrators to a neutral value, when the integrator saturator is in the saturation area, except when the output quantity of or an input quantity of at least one of the series-connected integrators has a value such that it would tend to bring the integrator saturator from the saturation area to the operating area.

In a lithographic projection apparatus, modified control of a moveable component within the apparatus is provided to improve control of the position and velocity of a point on the component that is set apart from the center of mass of the component. The force required to provide the center of mass of the component with the acceleration required for the point on the component is determined. The force in a given direction is corrected by an amount proportional to the product of the velocity of the point in an orthogonal direction and the angular velocity about an axis perpendicular to the two orthogonal directions.

Lithographic projection apparatus, computer program for control thereof, and device manufacturing method

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Eindhoven, Netherlands

Robertus Johannes Marinus De Jongh