The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 05, 2017
Filed:
Dec. 19, 2014
Asml Netherlands B.v., Veldhoven, NL;
Markus Franciscus Antonius Eurlings, Veldhoven, NL;
Niek Antonius Jacobus Maria Kleemans, Veldhoven, NL;
Antonius Johannes Josephus Van Dijsseldonk, Veldhoven, NL;
Ramon Mark Hofstra, Veldhoven, NL;
Oscar Franciscus Jozephus Noordman, Veldhoven, NL;
Tien Nang Pham, San Diego, CA (US);
Jan Bernard Plechelmus Van Schoot, Veldhoven, NL;
Jiun-Cheng Wang, Veldhoven, NL;
Kevin Weimin Zhang, San Diego, CA (US);
ASML Netherland B.V., Veldhoven, NL;
Abstract
A faceted reflector (″) for receiving an incident radiation beam () and directing a reflected radiation beam at a target. The faceted reflector comprises a plurality of facets, each of the plurality of facets comprising a reflective surface. The reflective surfaces of each of a first subset of the plurality of facets define respective parts of a first continuous surface and are arranged to reflect respective first portions of the incident radiation beam in a first direction to provide a first portion of the reflected radiation beam. The reflective surfaces of each of a second subset of the plurality of facets define respective parts of a second continuous surface and are arranged to reflect respective second portions of the incident radiation beam in a second direction to provide a second portion of the reflected radiation beam.