The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 05, 2018
Filed:
Jan. 23, 2015
Applicant:
Asml Netherlands B.v., Veldhoven, NL;
Inventors:
Jan Bernard Plechelmus Van Schoot, Eindhoven, NL;
Andrei Mikhailovich Yakunin, Eindhoven, NL;
Assignee:
ASML NETHERLANDS B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); H05G 2/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70433 (2013.01); G03F 7/7025 (2013.01); G03F 7/70033 (2013.01); G03F 7/70066 (2013.01); G03F 7/70091 (2013.01); G03F 7/70241 (2013.01); G03F 7/70425 (2013.01); G03F 7/70483 (2013.01); H05G 2/005 (2013.01); H05G 2/008 (2013.01);
Abstract
A lithographic system including a lithographic apparatus with an anamorphic projection system, and a radiation source configured to generate an EUV radiation emitting plasma at a plasma formation location, the EUV radiation emitting plasma having an elongate form in a plane substantially perpendicular to an optical axis of the radiation source.