The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 29, 2018
Filed:
Oct. 10, 2013
Asml Netherlands B.v., Veldhoven, NL;
Erik Roelof Loopstra, Eindhoven, NL;
Andrei Mikhailovich Yakunin, Mierlo, NL;
Vadim Yevgenyevich Banine, Deurne, NL;
Andrey Nikipelov, Eindhoven, NL;
Edgar Alberto Osorio Oliveros, Eindhoven, NL;
Alexander Matthijs Struycken, Eindhoven, NL;
Bert Pieter Van Drieënhuizen, Veldhoven, NL;
Jan Bernard Plechelmus Van Schoot, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A method of generating radiation for a lithography apparatus. The method comprises providing a continuously renewing fuel target () at a plasma formation location () and directing a continuous-wave excitation beam () at the plasma formation location such that fuel within the continuously renewing fuel target is excited by the continuous-wave excitation beam to a radiation generating plasma.