The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 04, 2019
Filed:
Oct. 07, 2016
Applicant:
Asml Netherlands B.v., Veldhoven, NL;
Inventors:
Yuri Johannes Gabriel Van De Vijver, Best, NL;
Johannes Hubertus Josephina Moors, Helmond, NL;
Wendelin Johanna Maria Versteeg, Eindhoven, NL;
Peter Gerardus Jonkers, Eindhoven, NL;
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70933 (2013.01); G03F 7/70841 (2013.01); G03F 7/70866 (2013.01); G03F 7/70883 (2013.01); G03F 7/70916 (2013.01);
Abstract
A lithographic apparatus is disclosed that includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate, a vacuum chamber through which the patterned beam of radiation is projected during use, and a purge system configured to provide a purge gas flow in the chamber.