The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 14, 2020
Filed:
Feb. 07, 2019
Asml Netherlands B.v., Veldhoven, NL;
Norbertus Josephus Martinus Van den Nieuwelaar, Tilburg, NL;
Victor Manuel Blanco Carballo, Eindhoven, NL;
Casper Roderik De Groot, Eindhoven, NL;
Rolf Hendrikus Jacobus Custers, Eindhoven, NL;
David Merritt Phillips, Hillsboro, OR (US);
Frederik Antonius Van der Zanden, Eindhoven, NL;
Pieter Lein Joseph Gunter, Weert, NL;
Erik Henricus Egidius Catharina Eummelen, Eindhoven, NL;
Yuri Johannes Gabriël Van de Vijver, Best, NL;
Bert Dirk Scholten, Best, NL;
Marijn Wouters, Eindhoven, NL;
Ronald Frank Kox, Peer, NL;
Jorge Alberto Vieyra Salas, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
An immersion lithography apparatus has a controller configured to control a substrate table to move along an exposure route including in order: an entry motion in which the substrate moves from an off-substrate position at which the immersion space does not overlap the substrate to an on-substrate position at which the immersion space at least partially overlaps the substrate, a transfer motion in which the substrate table changes speed and/or direction and moves for at least a transfer time after the substrate moves to the on-substrate position, and an expose motion in which the substrate is scanned and the patterned beam is projected onto the substrate, wherein throughout the transfer motion at least a part of the immersion space overlaps the substrate and wherein the patterned beam is not projected onto the substrate during the entry motion and the transfer motion.