Company Filing History:
Years Active: 2006-2025
Title: The Innovative Mind of Norbertus Josephus Martinus Van Den Nieuwelaar
Introduction:
Norbertus Josephus Martinus Van Den Nieuwelaar, a distinguished inventor hailing from Tilburg, NL, has made significant contributions to the field of lithography with a total of 13 patents under his belt. His groundbreaking work in the lithographic industry has reshaped the way we approach pellicle movement prediction and substrate support calculation.
Latest Patents:
One of Van Den Nieuwelaar's latest patents involves a lithographic method that predicts the deflection of a pellicle during its movement in a lithographic apparatus. By utilizing a complex model incorporating various parameters related to the pellicle properties and expected movement, the invention allows for accurate prediction of pellicle deflection, leading to enhanced lithographic processes.
Another notable patent by Van Den Nieuwelaar pertains to a method for calculating the route of a substrate support in an immersion lithographic apparatus. This innovative approach ensures that the substrate remains in contact with the immersion space during exposure, minimizes exposure defects at the substrate edge, and optimizes substrate movement for precise target exposures.
Career Highlights:
Norbertus Josephus Martinus Van Den Nieuwelaar is a key figure at ASML Netherlands B.V., a leading company in the lithography industry. His expertise and patented inventions have played a crucial role in advancing ASML's technological capabilities and maintaining its position as an industry leader in semiconductor manufacturing equipment.
Collaborations:
Van Den Nieuwelaar has collaborated closely with esteemed colleagues such as Johannes Onvlee and Victor Manuel Blanco Carballo. Together, they have worked on pioneering projects that have pushed the boundaries of lithographic innovation and set new standards in the industry.
Conclusion:
In conclusion, Norbertus Josephus Martinus Van Den Nieuwelaar's ingenuity and dedication to advancing lithographic technology have cemented his legacy as a pioneering inventor in the field. His patents, including the predictive pellicle deflection method and substrate support calculation technique, have made a significant impact on the industry, showcasing his exceptional talent and innovative spirit.