The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 21, 2020
Filed:
Aug. 22, 2016
Asml Netherlands B.v., Veldhoven, NL;
Norbertus Josephus Martinus Van Den Nieuwelaar, Tilburg, NL;
Victor Manuel Blanco Carballo, Eindhoven, NL;
Thomas Augustus Mattaar, Veldhoven, NL;
Johannes Cornelis Paulus Melman, Oisterwijk, NL;
Gerben Pieterse, Eindhoven, NL;
Johannes Theodorus Guillielmus Maria Van De Ven, Eindhoven, NL;
Jan-Piet Van De Ven, Veldhoven, NL;
Petrus Franciscus Van Gils, Rijen, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A route for a substrate support that supports a substrate in an immersion lithographic apparatus is calculated to satisfy the following constraints: after the edge of the substrate first contacts the immersion space, the substrate remains in contact with the immersion space until all target portions are exposed; exposures of target portions are performed while the substrate moves in a scan direction; and all movements of the substrate between exposures are, in a plane parallel to its upper surface, either curved or only in one of the scan directions or transverse directions. In order to reduce exposure defects at the edge of the substrate the outside portion of the substrate is avoided from being exposed to the immersion liquid. The transfer routes are designed to overly the substrate surface.