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For the Inventor, By the Inventor

Rijen, Netherlands

Petrus Franciscus Van Gils

USPTO Granted Patents = 11 

Average Co-Inventor Count = 4.4

ph-index = 1

Forward Citations = 3(Granted Patents)


Location History:

  • Ryen, NL (2015)
  • Berkel-Enschot, NL (2018)
  • Rijen, BE (2019)
  • Rijen, NL (2017 - 2024)

Company Filing History:

goldMedal11 out of 4,883 
 
Asml Netherlands B.v.
 patents

Years Active: 2015-2025

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11 patents (USPTO):
1. 12405542 - Method of determining a mark measurement sequence, stage apparatus and lithographic apparatus (2025-09-02),
2. 11874103 - Measurement apparatus (2024-01-16),
3. 11307507 - Method to obtain a height map of a substrate having alignment marks, substrate alignment measuring apparatus and lithographic apparatus (2022-04-19),
4. 11105619 - Measurement apparatus (2021-08-31),
5. 10908517 - Setpoint generator, lithographic apparatus, lithographic apparatus operating method, and device manufacturing method (2021-02-02),
6. 10747120 - Lithographic method and apparatus (2020-08-18),
7. 10627721 - Lithography apparatus, and a method of manufacturing a device (2020-04-21),
8. 10401735 - Lithographic method and apparatus (2019-09-03),
9. 10088756 - Lithographic apparatus and method (2018-10-02),
10. 9606457 - Lithographic apparatus and device manufacturing method (2017-03-28),
11. 9116446 - Lithographic apparatus and method (2015-08-25),

Title: Unveiling the Innovations of Petrus Franciscus Van Gils from Rijen, NL

Introduction:

Petrus Franciscus Van Gils is a distinguished inventor based in Rijen, Netherlands, with an impressive track record of 10 patents to his name. His groundbreaking contributions in the field of metrology have revolutionized the way measurement apparatus functions, showcasing his commitment to excellence and innovation.

Latest Patents:

Van Gils' latest patents demonstrate his prowess in enhancing the performance and efficiency of measurement apparatus. One of his notable inventions includes a measurement apparatus that integrates a first measuring apparatus, a second measuring apparatus, substrate stages, and substrate handlers to optimize throughput performance. Additionally, he has developed a method to obtain a height map of a substrate with alignment marks, showcasing his expertise in precision engineering.

Career Highlights:

Petrus Franciscus Van Gils is affiliated with ASML Netherlands B.V., a prominent technology company at the forefront of semiconductor lithography equipment. Through his collaboration with ASML, Van Gils has played a pivotal role in advancing cutting-edge technologies that drive innovation in the industry.

Collaborations:

Van Gils has had the privilege of working alongside accomplished professionals in his field, including Carolus Johannes Catharina Schoormans and Thomas Augustus Mattaar. Together, they form a dynamic team dedicated to pushing the boundaries of metrology and measurement technology.

Conclusion:

In conclusion, Petrus Franciscus Van Gils stands out as a visionary inventor whose ingenuity and expertise have significantly impacted the field of metrology. His relentless pursuit of innovation and collaboration with industry leaders exemplify his commitment to pushing the boundaries of technological advancement. Van Gils' contributions continue to inspire and shape the future of measurement apparatus, paving the way for transformative advancements in the industry.

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