The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 02, 2018
Filed:
Jun. 04, 2015
Asml Netherlands B.v., Veldhoven, NL;
Sander Kerssemakers, Veldhoven, NL;
Wilhelmus Petrus De Boeij, Veldhoven, NL;
Gerben Frank De Lange, Best, NL;
Christiaan Alexander Hoogendam, Veldhoven, NL;
Petrus Franciscus Van Gils, Berkel-Enschot, NL;
Jelmer Mattheüs Kamminga, Tilburg, NL;
Jan Jaap Kuit, Veldhoven, NL;
Carolus Johannes Catharina Schoormans, Hooge Mierde, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic apparatus comprising a support structure configured to be moved by a first scan distance during a single scanning operation when supporting a patterning device having a first extent in the scanning direction and to be moved by a second scan distance during a single scanning operation when supporting a patterning device having a second extent in the scanning N direction, and a substrate table configured to be moved by a third scan distance during a single scanning operation when the support structure supports a patterning device having the first extent in the scanning direction and to be moved by a fourth scan distance during a single scanning operation when the support structure supports a patterning device having the second extent in the scanning direction.