The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 28, 2017
Filed:
Jan. 24, 2013
Applicant:
Asml Netherlands B.v., Veldhoven, NL;
Inventors:
Norbertus Josephus Martinus Van Den Nieuwelaar, Tilburg, NL;
Petrus Franciscus Van Gils, Rijen, NL;
Arthur Erland Swaving, Waalre, NL;
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/42 (2006.01); G03B 27/58 (2006.01); G03B 27/32 (2006.01); G03F 7/20 (2006.01); G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/7075 (2013.01); G03F 7/00 (2013.01); G03F 7/70533 (2013.01); G03F 7/70725 (2013.01); G03F 7/70733 (2013.01); G03F 7/70991 (2013.01);
Abstract
A substrate handler for transferring substrates to be exposed from a track to a lithographic apparatus. The substrate handler comprises a controller. The controller is configured to determine an instance for starting a transfer process of a first one of the substrates. The instance is based on a predetermined processing characteristic of the lithographic apparatus, in order to maintain a transfer period of the substrate in the substrate handler substantially constant.