The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 19, 2010
Filed:
Jul. 05, 2007
Applicants:
Suzan Leonie Auer-jongepier, Valkenswaard, NL;
Norbertus Josephus Martinus Van Den Nieuwelaar, Tilburg, NL;
Johannes Onvlee, s-Hertogenbosch, NL;
Inventors:
Suzan Leonie Auer-Jongepier, Valkenswaard, NL;
Norbertus Josephus Martinus Van Den Nieuwelaar, Tilburg, NL;
Johannes Onvlee, s-Hertogenbosch, NL;
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03B 27/52 (2006.01);
U.S. Cl.
CPC ...
Abstract
A lithographic apparatus is disclosed that includes a utility substrate storage configured to hold a utility substrate, and a utility substrate scheduling unit configured to schedule the loading of a utility substrate in a flow of substrates in the lithographic apparatus.