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Den Bosch, Netherlands

Johannes Onvlee

This inventor holds 42 USPTO granted patents and 5 published patent applications and 5 EPO patents, primarily in Lithographic Technology. Top assignees: Asml Netherlands B.v., Asml Holding N.v.. Active years: 2006-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Johannes Onvlee. Retrieved from https://idiyas.com/inventor/johannes-onvlee

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 42 

% Patents Active = 59.5


Average Co-Inventor Count = 3.6

ph-index = 5

Forward Citations = 109(Granted Patents)


Location History:

  • Hertogenbosch, NL (2007)
  • ‘S-Hertogenbosch, NL (2008)
  • Veldhoven, NL (2019)
  • 's-Hertogenbosch, NL (2006 - 2024)

Company Filing History:

goldMedal42 out of 5,070 
 
Asml Netherlands B.v.
 patents
silverMedal8 out of 629 
 
Asml Holding N.v.
 patents
where one patent can have more than one assignee

Years Active: 2006-2025

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Areas of Expertise:
Lithographic Apparatus
Patterning Device
Reticle Cooling
Substrate Support
Gas Flow Optimization
Device Manufacturing
Inspection Methods
Radiation Beam Modulation
Processing Cell Control
Prediction Models
Metrology System
Task Planning
42 patents (USPTO):Explore Patents
1. 12442759 - Contaminant analyzing metrology system, lithographic apparatus, and methods thereof (2025-10-14),
2. 12032301 - Substrate support, lithographic apparatus and loading method (2024-07-09),
3. 11994848 - Systems and methods for adjusting prediction models between facility locations (2024-05-28),
4. 11556063 - Substrate support, lithographic apparatus and loading method (2023-01-17),
5. 10459354 - Lithographic apparatus and lithographic projection method (2019-10-29),
6. 10444647 - Methods and apparatus for determining the position of a target structure on a substrate, methods and apparatus for determining the position of a substrate (2019-10-15),
7. 10423081 - Reticle cooling by non-uniform gas flow (2019-09-24),
8. 10031428 - Gas flow optimization in reticle stage environment (2018-07-24),
9. 9977351 - Patterning device support, lithographic apparatus, and method of controlling patterning device temperature (2018-05-22),
10. 9857694 - Estimating deformation of a patterning device and/or a change in its position (2018-01-02),
11. 9766557 - Patterning device support, lithographic apparatus, and method of controlling patterning device temperature (2017-09-19),
12. 9696633 - Substrate handling apparatus and lithographic apparatus (2017-07-04),
13. 9645502 - Lithographic apparatus, programmable patterning device and lithographic method (2017-05-09),
14. 9632434 - Reticle cooling system in a lithographic apparatus (2017-04-25),
15. 9632433 - Patterning device support, lithographic apparatus, and method of controlling patterning device temperature (2017-04-25),

As an AI assistant specializing in innovations, inventions, inventors, patent attorneys, assignees, and patents, I can create an article about inventor Johannes Onvlee for you.

Title: Unveiling the Innovations of Johannes Onvlee

Introduction:

Johannes Onvlee, a talented inventor hailing from 's-Hertogenbosch, Netherlands, has made significant contributions to the field of technology with a remarkable portfolio of 41 patents.

Latest Patents:

One of his latest patents includes a cutting-edge "Substrate Support, Lithographic Apparatus and Loading Method," revolutionizing substrate support in semiconductor manufacturing. This patent introduces a novel substrate support with a clamping device and dither device to enhance process efficiency.

Another notable invention is the "Systems and Methods for Adjusting Prediction Models between Facility Locations," which optimizes semiconductor manufacturing processes by updating prediction models with local data from remote locations.

Career Highlights:

During his illustrious career, Johannes Onvlee has showcased his expertise at renowned companies such as ASML Netherlands B.V. and ASML Holding N.V., where he has played a pivotal role in driving innovation and technological advancement.

Collaborations:

Collaborating with esteemed colleagues like Pieter Willem Herman De Jager and Erwin John Van Zwet, Johannes Onvlee has fostered a culture of innovation, teamwork, and excellence in his professional endeavors.

Conclusion:

Johannes Onvlee's remarkable journey as an inventor reflects his unwavering commitment to pushing the boundaries of technology and delivering groundbreaking solutions in the semiconductor industry. His prolific patent portfolio and collaborative efforts underscore his invaluable contributions to the world of innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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