The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 09, 2017
Filed:
Mar. 07, 2012
Pieter Willem Herman DE Jager, Middelbeers, NL;
Vadim Yevgenyevich Banine, Deurne, NL;
Johannes Onvlee, 's-Hertogenbosch, NL;
Lucas Henricus Johannes Stevens, Eindhoven, NL;
Sander Frederik Wuister, Eindhoven, NL;
Nikolay Nikolaevich Iosad, Geldrop, NL;
Pieter Willem Herman De Jager, Middelbeers, NL;
Vadim Yevgenyevich Banine, Deurne, NL;
Johannes Onvlee, 's-Hertogenbosch, NL;
Lucas Henricus Johannes Stevens, Eindhoven, NL;
Sander Frederik Wuister, Eindhoven, NL;
Nikolay Nikolaevich Iosad, Geldrop, NL;
ASML NETHERLANDS B.V., Veldhoven, NL;
Abstract
In an embodiment, a lithographic apparatus is disclosed that includes a modulator configured to expose an exposure area of the substrate to a plurality of beams modulated according to a desired pattern and a projection system configured to project the modulated beams onto the substrate. The modulator includes a deflector to displace the plurality of beams with respect to an exposure area.