The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 25, 2017
Filed:
Apr. 29, 2015
Asml Holding N.v., Veldhoven, NL;
Asml Netherlands B.v., Veldhoven, NL;
Earl William Ebert, Jr., Oxford, CT (US);
Johannes Onvlee, s-Hertogenbosch, NL;
Samir A. Nayfeh, Shrewsbury, MA (US);
Mark Josef Schuster, Fairfield, CT (US);
Peter A. Delmastro, New Milfort, CT (US);
Christopher Charles Ward, Somerville, MA (US);
Frank Johannes Jacobus Van Boxtel, Eindhoven, NL;
Abdullah Alikhan, Wilton, CT (US);
Daniel Nathan Burbank, Wilton, CT (US);
Daniel Nicholas Galburt, Wilton, CT (US);
Justin Matthew Verdirame, Cambridge, MA (US);
Thomas Venturino, Wilton, CT (US);
ASML Holding N.V., Veldhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A system for controlling temperature of a patterning device in a lithographic apparatus is discussed. The system includes a patterning device support configured to support a patterning device and a reticle cooling system configured to provide substantially uniform temperature distribution across the patterning device. The reticle cooling system includes a first and second array of gas inlets configured to provide a first and second gas flow along a first and second direction across a surface of the patterning device, respectively, where first and second directions are opposite to each other. The reticle cooling system further includes a switching control system configured to control operation of the first and second arrays of gas inlets.