The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 24, 2019
Filed:
Dec. 02, 2015
Asml Holding N.v., Veldhoven, NL;
Asml Netherlands B.v., Veldhoven, NL;
Thomas Venturino, Wilton, CT (US);
Geoffrey Alan Schultz, Wilton, CT (US);
Daniel Nicholas Galburt, Wilton, CT (US);
Daniel Nathan Burbank, Wilton, CT (US);
Santiago E. Delpuerto, Wilton, CT (US);
Herman Vogel, Wilton, CT (US);
Johannes Onvlee, Veldhoven, NL;
Laurentius Johannes Adrianus Van Bokhoven, Veldhoven, NL;
Christopher Charles Ward, Wilton, CT (US);
ASML Holding N.V., Veldhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
An apparatus, system, and method cool a patterning device by supplying a non-uniform gas flow. The apparatus and system include a gas supply structure that supplies a gas flow across the first surface of the patterning device. The gas supply structure includes a gas supply nozzle specially configured to create a non-uniform gas flow distribution. A greater volume or velocity of the gas flow is directed to desired portion of the patterning device.