Suzan Leonie Auer-Jongepier

This inventor holds 6 USPTO granted patents. Top assignee: Asml Netherlands B.v.. Active years: 2005-2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Suzan Leonie Auer-Jongepier. Retrieved from https://idiyas.com/inventor/suzan-leonie-auer-jongepier

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 6

% Patents Active = 66.7

Average Co-Inventor Count = 3.7

ph-index = 3

Forward Citations = 33(Granted Patents)

Company Filing History:

6 out of 5,075

Asml Netherlands B.v.

patents

Years Active: 2005-2014

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6 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 8636458 - Integrated post-exposure bake track (2014-01-28),

2. 8634052 - Lithographic apparatus and method involving a ring to cover a gap between a substrate and a substrate table (2014-01-21),

3. 7817241 - Lithographic apparatus and device manufacturing method (2010-10-19),

4. 7679714 - Lithographic apparatus, combination of lithographic apparatus and processing module, and device manufacturing method (2010-03-16),

5. 7145643 - Interface unit, lithographic projection apparatus comprising such an interface unit and a device manufacturing method (2006-12-05),

6. 6879866 - Method, computer program product and apparatus for scheduling maintenance actions in a substrate processing system (2005-04-12),

Title: The Innovative Journey of Suzan Leonie Auer-Jongepier in Advanced Lithography

Introduction:

Suzan Leonie Auer-Jongepier, a talented inventor hailing from Valkenswaard, NL, has made significant contributions to the field of lithography. With an impressive portfolio of 6 patents, his groundbreaking work has revolutionized the semiconductor industry.

Latest Patents:

Auer-Jongepier's latest patents showcase his expertise in the development of cutting-edge technologies. The "Integrated Post-Exposure Bake Track" and the "Combined Post-Expose Bake and Chill Unit" are just a few examples of his innovative solutions for processing wafers.

Career Highlights:

Currently employed at ASML Netherlands B.V., Auer-Jongepier continues to push the boundaries of lithographic processes. His role in the development of systems and methods for wafer processing has solidified his position as a leader in the industry.

Collaborations:

Auer-Jongepier has had the privilege of working alongside accomplished professionals such as Johannes Onvlee and Reinder Teun Plug. Their collaborative efforts have resulted in the creation of groundbreaking technologies that have set new standards in the field of lithography.

Conclusion:

In conclusion, Suzan Leonie Auer-Jongepier's dedication to innovation and his remarkable contributions to lithography underscore his status as a pioneering inventor. His commitment to pushing the boundaries of technology continues to inspire and shape the future of the semiconductor industry.

Profile summary based on public USPTO records.

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]