The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 28, 2014
Filed:
Jun. 06, 2007
Suzan L. Auer-jongepier, Valkenswaard, NL;
Johannes Onvlee, s-Hertogenbosch, NL;
Petrus R. Bartray, Ysselsteyn, NL;
Bernardus A. J. Luttikhuis, Nuenen, NL;
Reinder T. Plug, Eindhoven, NL;
Hubert M. Segers, s-Hertogenbosch, NL;
Suzan L. Auer-Jongepier, Valkenswaard, NL;
Johannes Onvlee, s-Hertogenbosch, NL;
Petrus R. Bartray, Ysselsteyn, NL;
Bernardus A. J. Luttikhuis, Nuenen, NL;
Reinder T. Plug, Eindhoven, NL;
Hubert M. Segers, s-Hertogenbosch, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
Systems and methods for processing wafers, a combined post expose bake and chill unit, and an interface are disclosed. An exemplary system includes a lithography tool, local track, transfer device, transfer device handler, interface unit, and controller to schedule processing. An exemplary combined post expose bake and chill unit includes an enclosure having an opening in its side, and a bake unit and a chill unit in the enclosure. An exemplary interface includes a plurality of enclosures arranged around robot(s) that transfer wafers among the enclosures, one of the plurality of enclosures being an integrated bake and chill unit.