The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 21, 2014
Filed:
Nov. 27, 2007
Suzan Leonie Auer-jongepier, Valkenswaard, NL;
Jeroen Johannes Sophia Maria Mertens, Duizel, NL;
Frank Bernhard Sperling, Nuenen, NL;
Teunis Cornelis Van Den Dool, Delft, NL;
Eva Mondt, Eindhoven, NL;
Alexander Nikolov Zdravkov, Eindhoven, NL;
Paulus Martinus Hubertus Vissers, Nederweert, NL;
Suzan Leonie Auer-Jongepier, Valkenswaard, NL;
Jeroen Johannes Sophia Maria Mertens, Duizel, NL;
Frank Bernhard Sperling, Nuenen, NL;
Teunis Cornelis Van Den Dool, Delft, NL;
Eva Mondt, Eindhoven, NL;
Alexander Nikolov Zdravkov, Eindhoven, NL;
Paulus Martinus Hubertus Vissers, Nederweert, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic apparatus that includes a substrate table holding a substrate, a projection system configured to project a patterned beam of radiation onto the substrate, a liquid supply system configured to provide a liquid to a space between the projection system and the substrate table, and a ring located such that it covers a gap between the substrate and the substrate table, the ring being in contact with the substrate and with the substrate table.