The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 16, 2010
Filed:
Oct. 12, 2006
Johannes Onvlee, s-Hertogenbosch, NL;
Reinder Teun Plug, Eindhoven, NL;
Hubert Marie Segers, 's-Hertogenbosch, NL;
David Christopher Christopher Ockwell, Waalre, NL;
Paul Jacques Van Wijnen, Veldhoven, NL;
Suzan Leonie Auer-jongepier, Valkenswaard, NL;
Johannes Onvlee, s-Hertogenbosch, NL;
Reinder Teun Plug, Eindhoven, NL;
Hubert Marie Segers, 's-Hertogenbosch, NL;
David Christopher Christopher Ockwell, Waalre, NL;
Paul Jacques Van Wijnen, Veldhoven, NL;
Suzan Leonie Auer-Jongepier, Valkenswaard, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic apparatus configured to transfer a pattern from a patterning device onto a substrate includes an integrated post-exposure bake device, the post-exposure bake device configured to subject the substrate to a predefined temperature cycle. A post-exposure bake step of the substrate (a temperature cycle) is executed within a predetermined time period after the transfer of the pattern. The lithographic apparatus may be combined with a processing system having one or more processing modules. More efficient use may be made of the combination, allowing flexibility for a device manufacturing method.