The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 27, 2007
Filed:
May. 05, 2006
Norbertus Josephus Martinus Van Den Nieuwelaar, Tilburg, NL;
Johannes Onvlee, Hertogenbosch, NL;
Roel Boumen, Venlo, NL;
Norbertus Josephus Martinus Van Den Nieuwelaar, Tilburg, NL;
Johannes Onvlee, Hertogenbosch, NL;
Roel Boumen, Venlo, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A method of controlling a track apparatus in a lithocell apparatus arrangement, is presented herein. The lithocell includes a lithographic exposure apparatus configured to expose substrates and a track apparatus configured to prepare substrates before exposure and develop substrates after exposure. The method includes predicting times at which the lithographic exposure apparatus will be available to accept a prepared substrate for exposure from the track apparatus, and adjusting a rate at which the track apparatus prepares substrates so that a substrate is prepared in time for acceptance by the lithographic exposure apparatus.