The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 09, 2023
Filed:
Sep. 11, 2019
Asml Netherlands B.v., Veldhoven, NL;
Bearrach Moest, Eindhoven, NL;
Rowin Meijerink, Leiden, NL;
Thijs Schenkelaars, Eindhoven, NL;
Norbertus Josephus Martinus Van Den Nieuwelaar, Tilburg, NL;
Laurentius Johannes Adrianus Van Bokhoven, Veldhoven, NL;
ASML NETHERLAND B.V., Veldhoven, NL;
Abstract
A method of predicting deflection of a pellicle which will occur during movement of the pellicle in a lithographic apparatus, the method including receiving parameters regarding properties of the pellicle and receiving parameters regarding the expected movement of the pellicle. The parameters are applied to a model which predicts deflection of the pellicle as a function of those parameters. The model includes a plurality of sub-models which relate to different components of deflection of the pellicle. An output of the model may be used to predict.