The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 13, 2010

Filed:

Sep. 30, 2004
Applicants:

Norbertus Josephus Martinus Van Den Nieuwelaar, Tilburg, NL;

Willem Herman Gertruda Anna Koenen, Roermond, NL;

Johannes Onvlee, 's-Hertogenbosch, NL;

Henricus Petrus Johannes Van Lierop, Weert, NL;

Robert Jozef Dumont, Eindhoven, NL;

Jacobus Eelkman Rooda, Eindhoven, NL;

Michiel Antal Rogier Stoets, Eindhoven, NL;

Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06F 19/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

Scheduling of tasks in a lithographic apparatus, track unit or lithocell is performed by maintaining a register of the state of the machine and a database of tasks performable by the machine, generating possible sequences of tasks based on pre- and post-conditions on the system state (rather than a precedence relation) and selecting a sequence from the generated sequences that meets a given beginning state of the machine and a desired end state. Embodiments of the invention also allow for automated recovery from exceptions.


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