The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 05, 2014
Filed:
Feb. 29, 2012
Han-kwang Nienhuys, Utrecht, NL;
Martinus Agnes Willem Cuijpers, Veldhoven, NL;
Leon Martin Levasier, Hedel, NL;
Jan Bernard Plechelmus Van Schoot, Eindhoven, NL;
Yuri Johannes Gabriël Van DE Vijver, Best, NL;
Oleg Viacheslavovich Voznyi, Eindhoven, NL;
Franciscus Johannes Joseph Janssen, Geldrop, NL;
Danny Maria Hubertus Philips, Son en Breugel, NL;
Marcio Alexandre Cano Miranda, Curitiba, BR;
Oleksiy Galaktionov, Geldrop, NL;
Manish Ranjan, Eindhoven, NL;
Albert Pieter Rijpma, Veldhoven, NL;
Kursat Bal, Arnhem, NL;
Roger Wilhelmus Antonius Henricus Schmitz, Helmond, NL;
Alain Louis Claude Leroux, Eindhoven, NL;
Han-Kwang Nienhuys, Utrecht, NL;
Martinus Agnes Willem Cuijpers, Veldhoven, NL;
Leon Martin Levasier, Hedel, NL;
Jan Bernard Plechelmus Van Schoot, Eindhoven, NL;
Yuri Johannes Gabriël Van De Vijver, Best, NL;
Oleg Viacheslavovich Voznyi, Eindhoven, NL;
Franciscus Johannes Joseph Janssen, Geldrop, NL;
Danny Maria Hubertus Philips, Son en Breugel, NL;
Marcio Alexandre Cano Miranda, Curitiba, BR;
Oleksiy Galaktionov, Geldrop, NL;
Manish Ranjan, Eindhoven, NL;
Albert Pieter Rijpma, Veldhoven, NL;
Kursat Bal, Arnhem, NL;
Roger Wilhelmus Antonius Henricus Schmitz, Helmond, NL;
Alain Louis Claude Leroux, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic apparatus includes a substrate table constructed to hold a substrate, a projection system configured to project a patterned radiation beam through an opening and onto a target portion of the substrate, and a conduit having an outlet in the opening. The conduit is configured to deliver gas to the opening. The lithographic apparatus further includes a cooling apparatus controlled by a control system. The cooling apparatus is configured to cool the gas such that gas which travels from the opening to the substrate has a predetermined temperature when the gas is incident upon the substrate.