The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 25, 2020
Filed:
May. 09, 2019
Asml Netherlands B.v., Veldhoven, NL;
Daan Daniel Johannes Antonius Van Sommeren, Beuningen, NL;
Coen Hubertus Matheus Baltis, Eindhoven, NL;
Harold Sebastiaan Buddenberg, Sittard, NL;
Giovanni Luca Gattobigio, Eindhoven, NL;
Johannes Cornelius Paulus Melman, Oisterwijk, NL;
Günes Nakiboglu, Eindhoven, NL;
Theodorus Wilhelmus Polet, Geldrop, NL;
Walter Theodorus Matheus Stals, Eindhoven, NL;
Yuri Johannes Gabriël Van De Vijver, Best, NL;
Josephus Peter Van Lieshout, Eindhoven, NL;
Jorge Alberto Vieyra Salas, Eindhoven, NL;
Aleksandar Nikolov Zdravkov, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A substrate table configured to support a substrate for exposure in an immersion lithographic apparatus, the substrate table including: a support body having a support surface configured to support the substrate; and a cover ring fixed relative to the support body and configured to surround, in plan view, the substrate supported on the support surface, wherein the cover ring has an upper surface and at least a portion of the upper surface is configured so as to alter the stability of a meniscus of immersion liquid when moving along the upper surface towards the substrate.