Aleksandar Nikolov Zdravkov

This inventor holds 11 USPTO granted patents and 1 published patent application, plus 1 CIPO patent and 1 EPO patent. Top assignee: Asml Netherlands B.v.. Active years: 2019-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Aleksandar Nikolov Zdravkov. Retrieved from https://idiyas.com/inventor/aleksandar-nikolov-zdravkov

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

USPTO Granted Patents = 11 (Patent Applications = 1)

% Patents Active = 100.0

CIPO Patents = 1 (Patent Applications = 2)

EPO Patents = 1 (Patent Applications = 2)

Average Co-Inventor Count = 11.2

ph-index = 1

Forward Citations = 4(Granted Patents)

Company Filing History:

11 out of 5,087

Asml Netherlands B.v.

patents

Years Active: 2019-2026

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11 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12663733 - Lithography apparatus with improved stability (2026-06-23),

2. 12474629 - Membrane for EUV lithography (2025-11-18),

3. 12117726 - Pellicle and pellicle assembly (2024-10-15),

4. 12072620 - Method of manufacturing a membrane assembly (2024-08-27),

5. 11762281 - Membrane for EUV lithography (2023-09-19),

6. 11754918 - Pellicle and pellicle assembly (2023-09-12),

7. 11231646 - Pellicle and pellicle assembly (2022-01-25),

8. 10928722 - Method of manufacturing a membrane assembly for EUV lithography, a membrane assembly, a lithographic apparatus, and a device manufacturing method (2021-02-23),

9. 10908496 - Membrane for EUV lithography (2021-02-02),

10. 10571810 - Substrate table, a lithographic apparatus and a method of operating a lithographic apparatus (2020-02-25),

11. 10317804 - Substrate table, lithographic apparatus and method of operating a lithographic apparatus (2019-06-11),

Title: Dr. Aleksandar Nikolov Zdravkov: Pushing the Boundaries of Innovation in EUV Lithography

Introduction: Dr. Aleksandar Nikolov Zdravkov is a visionary inventor based in Eindhoven, NL, renowned for his groundbreaking work in the field of EUV lithography. With a portfolio of 7 patents to his name, Dr. Zdravkov's contributions have significantly advanced the realm of semiconductor manufacturing.

Latest Patents: Dr. Zdravkov's latest patents showcase his mastery in the development of cutting-edge technologies. One of his remarkable inventions includes a "Membrane for EUV lithography," which features a novel stack design to enhance the performance of EUV lithography systems. Additionally, his "Pellicle and pellicle assembly" patent introduces innovative three-dimensional expansion structures for pellicle assemblies, revolutionizing patterning device technologies.

Career Highlights: Dr. Zdravkov is a key figure at ASML Netherlands B.V., a leading player in the semiconductor equipment industry. His expertise in EUV lithography has propelled the company's technological advancements, positioning them at the forefront of innovation in the global market.

Collaborations: Throughout his career, Dr. Zdravkov has collaborated with industry luminaries such as Paul Janssen and David Ferdinand Vles. This collaborative spirit has led to the development of cutting-edge solutions that have redefined the landscape of EUV lithography.

Conclusion: Dr. Aleksandar Nikolov Zdravkov's dedication to innovation and his exceptional contributions to the field of EUV lithography underscore his status as a true trailblazer. His patents and inventions not only showcase his technical prowess but also serve as a source of inspiration for aspiring inventors worldwide, shaping a brighter future for the semiconductor industry.

Profile summary based on public USPTO records.