Asml Netherlands B.v.

Aleksandar Nikolov Zdravkov

Pieter-Jan Van Zwol

Paul Janssen

Arnoud Willem Notenboom

Mária Péter

David Ferdinand Vles

Maxim Aleksandrovich Nasalevich

Willem Joan Van Der Zande

Johannes Petrus Martinus Bernardus Vermeulen

Johan Hendrik Klootwijk

Willem-Pieter Voorthuijzen

Wilhelmus Theodorus Anthonius Johannes Van Den Einden

Marcus Adrianus Van De Kerkhof

Adrianus Johannes Maria Giesbers

Evgenia Kurganova

Hendrikus Jan Wondergem

Peter Simon Antonius Knapen

Antonius Franciscus Johannes De Groot

Derk Servatius Gertruda Brouns

Matthias Kruizinga

Hrishikesh Patel

Gijsbert Rispens

Erik Achilles Abegg

Gerrit Van Den Bosch

Nadja Schuh

Michiel Alexander Blauw

Chaitanya Krishna Ande

Nirupam Banerjee

Antonius Willem Verburg

Wouter Rogier Meijerink

Claudia Piliego

Nicolae Maxim

Raymond Olsman

Marcel Peter Meijer

Johannes Joseph Janssen

Andrey Alexandrovich Nikipelov

Theodorus Wilhelmus Polet

Giovanni Luca Gattobigio

Egbert Lenderink

Yuri Johannes Gabriël Van De Vijver

Günes Nakiboglu

Coen Hubertus Matheus Baltis

Jorge Alberto Vieyra Salas

Daan Daniel Johannes Antonius Van Sommeren

Harold Sebastiaan Buddenberg

Walter Theodorus Matheus Stals

Josephus Peter Van Lieshout

Johannes Christiaan Leonardus Franken

Dennis De Graaf

Johannes Cornelis Paulus Melman

Ties Wouter Van Der Woord

Alexey Sergeevich Kuznetsov

Alexander Ludwig Klein

Mahdiar Valefi

Sander Baltussen

Johannes Cornelius Paulus Melman

Membranes for EUV lithography are disclosed. In one arrangement, a membrane has a stack having layers in the following order: a first capping layer including an oxide of a first metal; a base layer including a compound having a second metal and an additional element selected from the group consisting of Si, B, C and N; and a second capping layer including an oxide of a third metal, wherein the first metal is different from the second metal and the third metal is the same as or different from the first metal.

Membrane for EUV lithography

A pellicle assembly includes a pellicle frame defining a surface onto which a pellicle is, or to be, attached. The pellicle assembly includes one or more three-dimensional expansion structures that allow the pellicle to expand under stress. A pellicle assembly for a patterning device, the pellicle assembly includes one or more actuators for moving the pellicle assembly towards and way from the patterning device.

Pellicle and pellicle assembly

A method for manufacturing a membrane assembly for EUV lithography, the method including: providing a stack including: at least one membrane layer supported by a planar substrate, wherein the planar substrate has an inner region and a border region around the inner region; and a first sacrificial layer between the planar substrate and the membrane layer; selectively removing the inner region of the planar substrate such that the membrane assembly has: a membrane formed from the at least one membrane layer, and a border holding the membrane, the border having the border region of the planar substrate and the first sacrificial layer situated between the border region and the membrane layer, wherein the selectively removing the inner region of the planar substrate includes using an etchant which has a similar etch rate for the membrane layer and its oxide and a substantially different etch rate for the first sacrificial layer.

Method of manufacturing a membrane assembly

The invention relates to a pellicle assembly comprising a pellicle frame defining a surface onto which a pellicle is attached. The pellicle assembly comprises one or more three-dimensional expansion structures that allow the pellicle to expand under stress. The invention also relates to a pellicle assembly for a patterning device comprising one or more actuators for moving the pellicle assembly towards and way from the patterning device.

A pellicle assembly is disclosed that has a pellicle frame defining a surface onto which a pellicle is to be attached. The pellicle assembly includes one or more three-dimensional expansion structures that allow the pellicle to expand under stress. There is also disclosed a pellicle assembly for a patterning device, the pellicle assembly including one or more actuators for moving the pellicle assembly towards and way from the patterning device.

Methods of manufacturing a membrane assembly where, in one arrangement, a stack includes a planar substrate and at least one membrane layer. The planar substrate includes an inner region, a border region around the inner region, a bridge region around the border region and an edge region around the bridge region. The inner region and a first portion of the bridge region are removed. The membrane assembly after removal has: a membrane formed from the at least one membrane layer, a border holding the membrane, the border formed from the border region, an edge section around the border, the edge section formed from the edge region, a bridge between the border and the edge section, the bridge formed from the at least one membrane layer and a second portion of the bridge region. The method further involves separating the edge section from the border by cutting or breaking the bridge.

Method of manufacturing a membrane assembly for EUV lithography, a membrane assembly, a lithographic apparatus, and a device manufacturing method

A substrate table configured to support a substrate for exposure in an immersion lithographic apparatus, the substrate table including: a support body having a support surface configured to support the substrate; and a cover ring fixed relative to the support body and configured to surround, in plan view, the substrate supported on the support surface, wherein the cover ring has an upper surface and at least a portion of the upper surface is configured so as to alter the stability of a meniscus of immersion liquid when moving along the upper surface towards the substrate.

Substrate table, a lithographic apparatus and a method of operating a lithographic apparatus

A substrate table configured to support a substrate for exposure in an immersion lithographic apparatus, the substrate table including: a support body having a support surface configured to support the substrate; and a cover ring fixed relative to the support body and configured to surround, in plan view, the substrate supported on the support surface, wherein the cover ring has an upper surface, wherein at least a portion of the upper surface is configured so as to alter the stability of a meniscus of immersion liquid when moving along the upper surface towards the substrate.

Substrate table, lithographic apparatus and method of operating a lithographic apparatus

Growing community of inventors

Eindhoven, Netherlands

Aleksandar Nikolov Zdravkov