The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 23, 2026

Filed:

Oct. 29, 2020
Applicant:

Asml Netherlands B.v., Veldhoven, NL;

Inventors:

Paulus Albertus Van Hal, Waalre, NL;

Diego Millo, Amsterdam, NL;

Aleksandar Nikolov Zdravkov, Eindhoven, NL;

Marcus Adrianus Van De Kerkhof, Helmond, NL;

Assignee:

ASML Netherlands B.V., Veldoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01); G03F 7/16 (2006.01);
U.S. Cl.
CPC ...
G03F 7/7095 (2013.01); G03F 7/165 (2013.01); G03F 7/707 (2013.01);
Abstract

The present invention relates to methods for improving the resistance of lithography substrate holders to corrosion. The present invention also relates to systems comprising lithography substrate holders with improved corrosion resistance, and to methods of fabricating devices, e.g. integrated circuits, using such systems. The present invention also relates to substrates with backsides configured to preferentially corrode when used in lithography. The present invention has particular use in connection with lithographic apparatus for fabricating devices, for example integrated circuits.


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