The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 15, 2024

Filed:

Jul. 11, 2023
Applicant:

Asml Netherlands B.v., Veldhoven, NL;

Inventors:

David Ferdinand Vles, Eindhoven, NL;

Chaitanya Krishna Ande, Eindhoven, NL;

Antonius Franciscus Johannes De Groot, Someren, NL;

Adrianus Johannes Maria Giesbers, Vlijmen, NL;

Johannes Joseph Janssen, Beesel, NL;

Paul Janssen, Eindhoven, NL;

Johan Hendrik Klootwijk, Eindhoven, NL;

Peter Simon Antonius Knapen, Deurne, NL;

Evgenia Kurganova, Nijmegen, NL;

Marcel Peter Meijer, Eindhoven, NL;

Wouter Rogier Meijerink, Eindhoven, NL;

Maxim Aleksandrovich Nasalevich, Eindhoven, NL;

Arnoud Willem Notenboom, Rosmalen, NL;

Raymond Olsman, Bennekom, NL;

Hrishikesh Patel, Eindhoven, NL;

Mária Péter, Eindhoven, NL;

Gerrit van den Bosch, Geldermalsen, NL;

Wilhelmus Theodorus Anthonius Johannes van den Einden, Deurne, NL;

Willem Joan Van Der Zande, Bussum, NL;

Pieter-Jan Van Zwol, Eindhoven, NL;

Johannes Petrus Martinus Bernardus Vermeulen, Leende, NL;

Willem-Pieter Voorthuijzen, 's-Hertogenbosch, NL;

Hendrikus Jan Wondergem, Veldhoven, NL;

Aleksandar Nikolov Zdravkov, Eindhoven, NL;

Assignee:

ASML NETHERLANDS B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/64 (2012.01);
U.S. Cl.
CPC ...
G03F 1/64 (2013.01);
Abstract

A pellicle assembly includes a pellicle frame defining a surface onto which a pellicle is, or to be, attached. The pellicle assembly includes one or more three-dimensional expansion structures that allow the pellicle to expand under stress. A pellicle assembly for a patterning device, the pellicle assembly includes one or more actuators for moving the pellicle assembly towards and way from the patterning device.


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