Nijmegen, Netherlands

Evgenia Kurganova

USPTO Granted Patents = 11 

 

 

Average Co-Inventor Count = 11.8

ph-index = 2

Forward Citations = 5(Granted Patents)


Location History:

  • Veldhoven, NL (2022)
  • Nijmegen, NL (2022 - 2024)

Company Filing History:


Years Active: 2022-2025

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11 patents (USPTO):Explore Patents

Sure, here is the article about inventor Evgenia Kurganova:

Title: Innovator Spotlight: Evgenia Kurganova in Nijmegen, NL

Introduction:

Evgenia Kurganova is a prolific inventor based in Nijmegen, NL, known for his innovative contributions in the field of lithographic apparatus. With an impressive portfolio of 7 patents, Kurganova has made significant advancements in stress reduction techniques and material coatings for pellicles used in lithography.

Latest Patents:

One of Kurganova's latest patents involves the development of a metal-silicide-nitridation process for stress reduction in pellicles used in lithographic apparatus. This patent introduces the use of nitridated metal silicide or nitridated silicon in pellicle manufacturing, enhancing their performance and longevity. Additionally, Kurganova has patented a method for simultaneous double-side coating of multilayer graphene pellicles, revolutionizing the production process and improving the effectiveness of these critical components.

Career Highlights:

Evgenia Kurganova is associated with ASML Netherlands B.V., a leading company in the field of lithography equipment. His tenure at ASML has been marked by groundbreaking research and development efforts that have advanced the capabilities of lithographic systems. Kurganova's expertise in material science and lithography technology has positioned him as a key contributor to the company's success.

Collaborations:

In his professional journey, Kurganova has collaborated with esteemed colleagues such as Pieter-Jan Van Zwol and Adrianus Johannes Maria Giesbers. Together, they have worked on innovative projects that have shaped the landscape of lithography technology. Through collaboration and knowledge-sharing, Kurganova and his coworkers have achieved remarkable milestones in the field.

Conclusion:

Evgenia Kurganova's remarkable achievements in the realm of lithographic apparatus underscore his commitment to innovation and excellence. His patented inventions reflect his ingenuity and dedication to advancing technology in the semiconductor industry. With a bright future ahead, Kurganova continues to push the boundaries of possibility in lithography, leaving a lasting impact on the field and inspiring future generations of inventors.

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