The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 26, 2025
Filed:
Feb. 17, 2021
Asml Netherlands B.v., Veldhoven, NL;
Evgenia Kurganova, Nijmegen, NL;
Gosse Charles De Vries, Veldhoven, NL;
Alexey Olegovich Polyakov, Veldhoven, NL;
Jim Vincent Overkamp, Eindhoven, NL;
Teis Johan Coenen, Vught, NL;
Tamara Druzhinina, Eindhoven, NL;
Sonia Castellanos Ortega, Leiden, NL;
Olivier Christian Maurice Lugier, Amsterdam, NL;
ASML NETHERLANDS B.V., Veldhoven, NL;
Abstract
Methods and apparatus for forming a patterned layer of material are disclosed. In one arrangement, a deposition-process material is provided in gaseous form. A layer of the deposition-process material is formed on the substrate by causing condensation or deposition of the gaseous deposition-process material. A selected portion of the layer of deposition-process material is irradiated to modify the deposition-process material in the selected portion.