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For the Inventor, By the Inventor

Vught, Netherlands

Teis Johan Coenen

This inventor holds 12 USPTO granted patents and 3 published patent applications, primarily in Metrology and Lithography. Top assignee: Asml Netherlands B.v.. Active years: 2017-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Teis Johan Coenen. Retrieved from https://idiyas.com/inventor/teis-johan-coenen

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 12 

% Patents Active = 91.7

Average Co-Inventor Count = 4.8

ph-index = 2

Forward Citations = 11(Granted Patents)


Location History:

  • Veldhoven, NL (2017 - 2018)
  • Vught, NL (2017 - 2024)

Company Filing History:

goldMedal12 out of 5,093 
 
Asml Netherlands B.v.
 patents

Years Active: 2017-2026

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Areas of Expertise:
Integrated Circuits
Measurement Correction
Patterned Layer Formation
Metrology Apparatus
Particle Beam
Defect Repair
Radiation Beam
Edge Roughness
Electron Injector
Lithographic Process
12 patents (USPTO):Explore Patents
1. 12663727 - Method for correcting measurements in the manufacture of integrated circuits and associated apparatuses (2026-06-23),
2. 12399428 - Method and apparatus for forming a patterned layer of material (2025-08-26),
3. 12325911 - Method and apparatus for forming a patterned layer of material (2025-06-10),
4. 12140875 - Metrology measurement method and apparatus (2024-11-12),
5. 11996267 - Particle beam apparatus, defect repair method, lithographic exposure process and lithographic system (2024-05-28),
6. 11353796 - Method and apparatus for determining a radiation beam intensity profile (2022-06-07),
7. 10996568 - Methods and apparatus for metrology (2021-05-04),
8. 10725387 - Determining an edge roughness parameter of a periodic structure (2020-07-28),
9. 10670974 - Metrology apparatus for and a method of determining a characteristic of interest of a structure on a substrate (2020-06-02),
10. 10103508 - Electron injector and free electron laser (2018-10-16),
11. 9853412 - Radiation source (2017-12-26),
12. 9728931 - Electron injector and free electron laser (2017-08-08),

Title: Teis Johan Coenen: Pioneering Innovations in Semiconductor Technology

Introduction:

Teis Johan Coenen, a visionary inventor based in Vught, NL, is a prominent figure in the world of semiconductor technology. With a strong passion for innovation and a track record of excellence, he has established himself as a trailblazer in the field of inventions.

Latest Patents:

Teis Johan Coenen's latest patents showcase his expertise in the development of cutting-edge technology. These include a particle beam apparatus, defect repair method, lithographic exposure process, and lithographic system. His inventions aim to enhance the efficiency and accuracy of semiconductor manufacturing processes.

Career Highlights:

With an impressive total of 8 patents to his name, Teis Johan Coenen has made significant contributions to the semiconductor industry. His work at ASML Netherlands B.V. has been instrumental in advancing the capabilities of semiconductor manufacturing equipment, setting new standards for precision and performance.

Collaborations:

Teis Johan Coenen has collaborated with top professionals in the field, including Andrey Alexandrovich Nikipelov and Erik Roelof Loopstra. Together, they have worked on innovative projects that have pushed the boundaries of semiconductor technology and paved the way for future advancements in the industry.

Conclusion:

In conclusion, Teis Johan Coenen's dedication to innovation and his quest for excellence have positioned him as a leading figure in the world of semiconductor technology. His groundbreaking inventions continue to inspire inventors and shape the future of technology, leaving a lasting impact on the industry for years to come.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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