The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 02, 2020
Filed:
Dec. 27, 2018
Asml Netherlands B.v., Veldhoven, NL;
Gerrit Jacobus Hendrik Brussaard, Boxtel, NL;
Petrus Wilhelmus Smorenburg, Veldhoven, NL;
Teis Johan Coenen, Vught, NL;
Niels Geypen, Lommel, BE;
Peter Danny Van Voorst, Nijmegen, NL;
Sander Bas Roobol, Veldhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A metrology apparatus for determining a characteristic of interest of a structure on a substrate, the structure having diffractive properties, the apparatus comprising: focusing optics configured to focus illumination radiation comprising a plurality of wavelengths onto the structure; a first detector configured to detect at least part of the illumination radiation which has been diffracted from the structure; and additional optics configured to produce, on at least a portion of the first detector, a wavelength-dependent spatial distribution of different wavelengths of the illumination radiation which has been diffracted from the structure, wherein the first detector is arranged to detect at least a non-zero diffraction order of the illumination radiation which has been diffracted from the structure.