Veldhoven, Netherlands

Sander Bas Roobol

This inventor holds 24 USPTO granted patents and 2 published patent applications and 1 EPO patent, primarily in Integrated Circuit Metrology. Top assignee: Asml Netherlands B.v.. Active years: 2018-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Sander Bas Roobol. Retrieved from https://idiyas.com/inventor/sander-bas-roobol

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 24 

% Patents Active = 100.0

 

Average Co-Inventor Count = 3.8

ph-index = 3

Forward Citations = 22(Granted Patents)


Company Filing History:


Years Active: 2018-2026

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Areas of Expertise:
Integrated Circuits
Metrology
Optical Detection
Radiation Profiling
Inspection Apparatus
High Harmonic Radiation
Illumination Source
Diffractive Optical Systems
Edge Roughness
Performance Prediction
24 patents (USPTO):Explore Patents

Title: Innovator Spotlight: Sander Bas Roobol

Introduction:

Sander Bas Roobol is a prominent inventor based in Veldhoven, Netherlands, with an impressive portfolio of 21 patents. His innovative work focuses on methods and apparatus for predicting and monitoring the performance of measurement methods, particularly in the field of EUV or soft x-ray radiation generation through higher harmonic generation.

Latest Patents:

1. Methods and apparatus for predicting performance of a measurement method: Roobol's patent involves a radiation source arrangement that interacts with a gaseous medium to generate EUV or soft x-ray radiation using higher harmonic generation. The operating condition is monitored by detecting third radiation resulting from the interaction, enabling feedback control for stable operation.

2. Method and apparatus for determining a radiation beam intensity profile: This patent details a method to determine the intensity profile of a radiation beam by employing a diffraction structure and measuring diffracted radiation signals, ultimately enabling the precise analysis of the radiation beam's intensity distribution.

Career Highlights:

Sander Bas Roobol is affiliated with ASML Netherlands B.V., a renowned company in the field of semiconductor equipment manufacturing. At ASML, Roobol has played a pivotal role in advancing technological innovations related to radiation generation and measurement methodologies.

Collaborations:

Throughout his career, Roobol has collaborated closely with talented individuals in the industry, including Simon Gijsbert Josephus Mathijssen and Nan Lin. Together, they have contributed significantly to the development of cutting-edge technologies in the realm of radiation source arrangements and intensity profiling.

Conclusion:

Sander Bas Roobol stands out as a visionary inventor with a keen focus on revolutionizing measurement methods and radiation beam analysis. His patents reflect a commitment to advancing technological frontiers, particularly in the domain of EUV and soft x-ray radiation generation. Collaborating with experts in the field, Roobol continues to make substantial contributions to the innovative landscape of semiconductor equipment manufacturing.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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